JPH0549730B2 - - Google Patents

Info

Publication number
JPH0549730B2
JPH0549730B2 JP60208098A JP20809885A JPH0549730B2 JP H0549730 B2 JPH0549730 B2 JP H0549730B2 JP 60208098 A JP60208098 A JP 60208098A JP 20809885 A JP20809885 A JP 20809885A JP H0549730 B2 JPH0549730 B2 JP H0549730B2
Authority
JP
Japan
Prior art keywords
powder
metals
iron group
rare earth
hot
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP60208098A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6270550A (ja
Inventor
Kenichi Hijikata
Kazuyuki Sato
Hitoshi Maruyama
Ryoko Furuhashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Materials Corp
Original Assignee
Mitsubishi Materials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Materials Corp filed Critical Mitsubishi Materials Corp
Priority to JP60208098A priority Critical patent/JPS6270550A/ja
Publication of JPS6270550A publication Critical patent/JPS6270550A/ja
Publication of JPH0549730B2 publication Critical patent/JPH0549730B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Powder Metallurgy (AREA)
  • Physical Vapour Deposition (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Manufacturing Optical Record Carriers (AREA)
JP60208098A 1985-09-20 1985-09-20 タ−ゲツト材 Granted JPS6270550A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60208098A JPS6270550A (ja) 1985-09-20 1985-09-20 タ−ゲツト材

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60208098A JPS6270550A (ja) 1985-09-20 1985-09-20 タ−ゲツト材

Publications (2)

Publication Number Publication Date
JPS6270550A JPS6270550A (ja) 1987-04-01
JPH0549730B2 true JPH0549730B2 (en]) 1993-07-27

Family

ID=16550601

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60208098A Granted JPS6270550A (ja) 1985-09-20 1985-09-20 タ−ゲツト材

Country Status (1)

Country Link
JP (1) JPS6270550A (en])

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63118028A (ja) * 1986-11-06 1988-05-23 Hitachi Metals Ltd 希土類元素−遷移金属元素タ−ゲツト及びその製造方法
JPS63250429A (ja) * 1987-04-06 1988-10-18 Seiko Instr & Electronics Ltd イツテルビウム−遷移金属系合金の製造方法
JPH0768612B2 (ja) * 1987-04-20 1995-07-26 日立金属株式会社 希土類金属―鉄族金属ターゲット用合金粉末、希土類金属―鉄族金属ターゲット、およびそれらの製造方法
DE3885690T2 (de) * 1987-09-17 1994-06-09 Seiko Epson Corp Verfahren zum Herstellen eines Zerstäubungstargets zur Verwendung bei der Herstellung eines magnetooptischen Aufzeichnungsmediums.
US4824481A (en) * 1988-01-11 1989-04-25 Eaastman Kodak Company Sputtering targets for magneto-optic films and a method for making
US5439500A (en) * 1993-12-02 1995-08-08 Materials Research Corporation Magneto-optical alloy sputter targets
KR100749658B1 (ko) 2003-08-05 2007-08-14 닛코킨조쿠 가부시키가이샤 스퍼터링 타겟트 및 그 제조방법
WO2006051737A1 (ja) 2004-11-15 2006-05-18 Nippon Mining & Metals Co., Ltd. 金属ガラス膜作製用スパッタリングターゲット及びその製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0796701B2 (ja) * 1984-12-12 1995-10-18 日立金属株式会社 スパッタ用ターゲットとその製造方法
JPS61229314A (ja) * 1985-04-03 1986-10-13 Hitachi Metals Ltd タ−ゲツト材料およびその製造方法

Also Published As

Publication number Publication date
JPS6270550A (ja) 1987-04-01

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees